The Center for X-Ray Optics is a multi-disciplined research group within Lawrence Berkeley National Laboratory's (LBNL) Materials Sciences Division (MSD). Notice to users.
The world's highest resolution projection lithography tool.
The SEMATECH Berkeley Microfield Exposure Tool (MET)
"For a new lithography technology to be successful, the supporting ecosystem must be developed years in advance. The MET is used by researchers from around the world for early learning in key areas such as resists, processing, and masks."
Patrick Naulleau,
MET Principal Investigator
About the MET.
The MET is a SEMATECH-sponsored 0.3-NA extreme ultraviolet (EUV) microlithography tool situated on undulator beamline 12.0.1.3 of the Advanced Light Source at Lawrence Berkeley National Laboratory. The MET has a unique programmable coherence illuminator that allows it to achieve world-leading 12-nm imaging resolution.
World's first demonstration of sub-16-nm dense patterning using conventional photolithography. February 2010.
The leader in resolution.
The METβs unique capabilities allow it to reach down to 12-nm, today, giving researchers a clear and unparalleled view into the future of photolithography. Using these capabilities, materials researchers from Inpria Corporation have developed photoresists capable of sub-16-nm patterning.
Resist research.
Resist line edge roughness (LER) negatively affects process yield and device performance. Working in collaboration with industry, national labs, and academia, CXRO researchers use the MET to quantify LER, find its root causes, and discover ways to mitigate it. The image to the right shows anisotropic three-dimensional details of typical LER.
Visit the MET homepage.
Visit met.lbl.gov to learn more about the MET.The MET team.
Chris Anderson
Project Scientist
Suchit Bhattarai
Graduate Student Research Assistant
Mark Binenbaum
Senior Research Technician
Rikos Chao
Graduate Student Research Assistant
Rene Claus
Graduate Student Research Assistant
Michael Jones
ME Technologist
Chanin King
Research Technician
Ryan Miyakawa
Project Scientist
Patrick Naulleau
CXRO Director &Senior Staff Scientist
Jessica Ritland
Senior Research Technician
Kurt Schlueter
Research Technician
Jessalyn Sincher
Senior Research TechnicianExplore the Center for X-Ray Optics
Nanomagnetism
X-Ray Microscopy
EUV Lithography
EUV Mask Imaging
Reflectometry
Zoneplate Lenses
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