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The World's Leading Symposium on Lithography and Nanofabrication

EIPBN, the "3-Beams", Conference, is the premier conference on the science and technology of nanopatterning.  Traditionally focused on electron, ion, and photon beams, (the 3 beams), the technology of nanofabrication covered in this conference has grown to include nanoimprint and molecular self-assembly as well. This conference is the place to hear the newest techniques and the latest advances. To browse this year's program or search for a topic or author in the program click here.

 

ONLINE REGISTRATION ENDS MAY 18, 2012.  Click here for details.

To sign up for the EIPBN exclusive after conference Big Island tour click here.

Announcing the EIPBN 2012 Entrepreneurs Challenge.  The first deadline is April 30, 2012 (extended).  For details click here.



EIPBN SLIDE SHOWS 2011: Micrograph Contest Winners

ABOUT MICROGRAPH CONTEST & PAST WINNERS
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