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Raith gmbh. raith micrograph award 2011
2012-05-16
germanywide .bandgap Nano bay barnacles for nano biomechanical systems500 x 500 nm containers etched in 3C.SiC 100 grown on Si. Firstly a PMMA two layer system was applied to the specimen, which was exposed in a Raith 150 Electron Beam Lithography system. After development a 30 nm thick AlN was applied by sputter deposition. Due to that, the side walls of the exposed areas in the PMMA become covered as well and remain as thin walls

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